Henniker Scientific (www.henniker-scientific.com) is proud to announce the release of CLAM II, the company’s flagship R&D sputtering system. This motorized CLAM opening provides full, unobstructed access for the easiest possible service and maintenance operations.

The new system has UHV construction with a differentially pumped CLAM seal that can achieve base pressures of less than 1^-9mbar. It also features seven UHV sputter-up 2” circular targets that can be operated vertically upwards or at the focal point. The system offers a shutter with in-vacuum stepper motor for step layer deposition.

The CLAM II Magnetron Sputter Deposition System is designed with a two-axis motorized manipulator, which contains 2″x1″ sample receiving stations, one placed over the vertical position and one at the focal point.

The system is configured for reactive sputtering with 2° x 360° continuous rotation sample holder with complete software positional indexing, as well as sample heating up to 1200°C. The system also features a 4 x position introduction chamber with halogen lamp, an in-situ ion source for sample cleaning, CCD camera, residual gas analyzer, and 150°C bakeout. The CLAM II has deposition rate quartz balance operating in both RF and DC depositing modes.